1. Handbook of ion beam processing technology :
پدیدآورنده : edited by Jerome J. Cuomo and Stephen M. Rossnagel, Harold R. Kaufman.
کتابخانه: Center and Library of Islamic Studies in European Languages (Qom)
موضوع : Ion bombardment-- Industrial applications.,Ion implantation.,Bombardement ionique-- Applications industrielles.,Ions-- Implantation.,Ion bombardment-- Industrial applications.,Ion implantation.,TECHNOLOGY & ENGINEERING-- Electronics-- Digital.,TECHNOLOGY & ENGINEERING-- Electronics-- Microelectronics.
رده :
QC702
.
7
.
I55
H36
1989eb
2. Handbook of ion beam processing technology :
پدیدآورنده : edited by Jerome J. Cuomo and Stephen M. Rossnagel, Harold R. Kaufman.
کتابخانه: Center and Library of Islamic Studies in European Languages (Qom)
موضوع : Ion bombardment-- Industrial applications.,Ion implantation.,Bombardement ionique-- Applications industrielles.,Ions-- Implantation.,Aufsatzsammlung,Bombardement ionique-- Applications industrielles.,Ion bombardment-- Industrial applications.,Ion implantation.,Ion implantation.,Ionenimplantation,Ionenstrahl,Ions-- Implantation.,Materialbearbeitung
رده :
QC702
.
7
.
I55
H36
1989
3. The film and depth profile analysis
پدیدآورنده : Edited by H. Oechsner
کتابخانه: Central Library and Document Center of Shahid Madani University of Azarbayjan (East Azarbaijan)
موضوع : Thin films - Surfaces,Surface chemistry,Sputtering (physics)
رده :
QC
,
176
.
84
,.
S93T46
,
1984
4. Thin Film and Depth Profile Analysis
پدیدآورنده : edited by Hans Oechsner.
کتابخانه: Center and Library of Islamic Studies in European Languages (Qom)
موضوع : Physical organic chemistry.,Surfaces (Physics)
رده :
QC176
.
84
.
S93
E358
1984
5. Thin film and depth profile analysis
پدیدآورنده : edited by H., Oechsner; with contributions by H.-W. Etzkorn...]et al.[
کتابخانه: Library of Institute for Research in Fundamental Sciences (Tehran)
موضوع : Surfaces ، Thin films,، Surface chemistry,، Sputtering )Physics(
رده :
QC
176
.
84
.
S93T46
1984
